Small-Signal Impedance and Split C-V Characterization of High-κ SiC Power MOSFETs

نویسندگان

چکیده

In this work, the improvement of SiC power MOSFET performance achieved using high-κ gate-dielectrics instead standard SiO2 is investigated by means advanced gate-impedance characterization. The benefit with high dielectric constant demonstrated comparing MOSFETs pure high-κ, a stack SiO2/high-κ, as well SiO2. Namely, fabricated show superior to commercial SiO2/SiC interface respect channel resistance and quality. proposed characterization approach non-destructive applicable packaged devices.

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ژورنال

عنوان ژورنال: Materials Science Forum

سال: 2023

ISSN: ['1422-6375', '0250-9776', '0255-5476', '1662-9752', '1662-9760']

DOI: https://doi.org/10.4028/p-2388hx